刚芹果. 触变性流体在旋转圆盘上的流动[J]. 力学与实践, 2002, 24(2). DOI: 10.6052/1000-0992-2001-016
引用本文: 刚芹果. 触变性流体在旋转圆盘上的流动[J]. 力学与实践, 2002, 24(2). DOI: 10.6052/1000-0992-2001-016
FLOW OF THIXOTROPIC FLUID ON ROTATING DISK[J]. MECHANICS IN ENGINEERING, 2002, 24(2). DOI: 10.6052/1000-0992-2001-016
Citation: FLOW OF THIXOTROPIC FLUID ON ROTATING DISK[J]. MECHANICS IN ENGINEERING, 2002, 24(2). DOI: 10.6052/1000-0992-2001-016

触变性流体在旋转圆盘上的流动

FLOW OF THIXOTROPIC FLUID ON ROTATING DISK

  • 摘要: 采用甩涂过程的基本方程, 导得触变性流体在旋转圆盘上流动的速度分布. 并利用特征线法, 得到薄膜厚度的方程. 对其定性分析表明, 流体的重建系数越小和破坏系数越大, 将加快甩涂过程.

     

    Abstract: With the basic equations of rotating coating process,the velocity distribution of the flow of a thixotropic fluidon a rotating disk was derived. The equation for thickness of film wasobtained by the method of characteristics. The qualitative analysisshowed that the decrease of build-up constant and the increase ofbreakdown constant will accelerate the process of rotating coating.

     

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